300mm back grinder GNX300B

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SERIES line-up
GNX200B・GNX300B _________________________________________________________________________________________________________________________________
CONCEPT
Back grinder best seller __________________________________________________________________________________________________________________________________
Feature
  • Recognized as a best-selling back grinder due to its superior performance and reliability.
  • Features an index table for efficient wafer handling and precise positioning.
  • Incorporates down-feed grinding technology for high-accuracy wafer thinning and surface quality.
Supports various processes with the addition of a coin stack unit and stress relief equipment, ensuring flexible adaptation to process advancements.
Uses of the 300mm Back Grinder GNX300B
  1. Wafer Thinning for Advanced Semiconductor Devices
    • Enables precise grinding of 300mm wafers, supporting the production of cutting-edge semiconductor technologies.
  2. 3D Packaging and TSV Applications
    • Facilitates Through-Silicon Via (TSV) and 3D integrated circuit (IC) packaging processes by achieving ultra-thin wafer dimensions with exceptional surface quality.
  3. MEMS Manufacturing
    • Ideal for producing thin wafers required for Micro-Electro-Mechanical Systems (MEMS) with strict cleanliness and thickness specifications.
  4. Optoelectronic Device Production
    • Supports the fabrication of wafers used in LEDs, sensors, and other optoelectronic applications requiring thin, high-quality substrates.
  5. Stress Relief and Warpage Control
    • Equipped to perform stress relief processes, minimizing wafer warping and enhancing reliability for downstream applications.
  6. High-Volume Production
    • Designed for high throughput and consistent performance, making it suitable for mass production in semiconductor manufacturing.
  7. Research and Development
    • Widely used in R&D for prototyping and testing new semiconductor processes and devices.
The GNX300B offers precision, versatility, and efficiency, making it a critical tool for modern semiconductor manufacturing.